Authors: LAIRD DL ENGELSTAD RL PUISTO DM ACOSTA RE CUMMINGS KD JOHNSON WA

Citation: Dl. Laird et al., PREDICTING INPLANE DISTORTION FROM ELECTRON-BEAM LITHOGRAPHY ON X-RAYMASK MEMBRANES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4308-4313

Authors: ACOSTA RE PUISTO D

Citation: Re. Acosta et D. Puisto, IMAGE PLACEMENT ERRORS IN X-RAY MASKS INDUCED BY CHANGES IN RESIST STRESS DURING ELECTRON-BEAM WRITING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4354-4358