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Results: 1-11 |
Results: 11
FLOW-TUBE INVESTIGATION OF THE HIGH-TEMPERATURE REACTION BETWEEN BCL3AND NH3
Authors: MCDANIEL AH ALLENDORF MD
Citation: Ah. Mcdaniel et Md. Allendorf, FLOW-TUBE INVESTIGATION OF THE HIGH-TEMPERATURE REACTION BETWEEN BCL3AND NH3, The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 102(40), 1998, pp. 7804-7812
UNDERSTANDING GAS-PHASE REACTIONS IN THE THERMAL CVD OF HARD COATINGSUSING COMPUTATIONAL METHODS
Authors: ALLENDORF MD MELIUS CF
Citation: Md. Allendorf et Cf. Melius, UNDERSTANDING GAS-PHASE REACTIONS IN THE THERMAL CVD OF HARD COATINGSUSING COMPUTATIONAL METHODS, Surface & coatings technology, 109(1-3), 1998, pp. 191-199
THERMODYNAMICS AND KINETICS OF GAS-PHASE REACTIONS IN THE TI-CL-H SYSTEM
Authors: TEYSSANDIER F ALLENDORF MD
Citation: F. Teyssandier et Md. Allendorf, THERMODYNAMICS AND KINETICS OF GAS-PHASE REACTIONS IN THE TI-CL-H SYSTEM, Journal of the Electrochemical Society, 145(6), 1998, pp. 2167-2178
THERMOCHEMISTRY OF MOLECULES IN THE B-N-CL-H SYSTEM - AB-INITIO PREDICTIONS USING THE BAC-MP4 METHOD
Authors: ALLENDORF MD MELIUS CF
Citation: Md. Allendorf et Cf. Melius, THERMOCHEMISTRY OF MOLECULES IN THE B-N-CL-H SYSTEM - AB-INITIO PREDICTIONS USING THE BAC-MP4 METHOD, The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 101(14), 1997, pp. 2670-2680
ASPECTS OF NITROGEN SURFACE-CHEMISTRY RELEVANT TO TIN CHEMICAL-VAPOR-DEPOSITION
Authors: SCHULBERG MT ALLENDORF MD OUTKA DA
Citation: Mt. Schulberg et al., ASPECTS OF NITROGEN SURFACE-CHEMISTRY RELEVANT TO TIN CHEMICAL-VAPOR-DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(6), 1996, pp. 3228-3235
THE ADSORPTION OF HYDROGEN-CHLORIDE ON POLYCRYSTALLINE BETA-SILICON CARBIDE
Authors: SCHULBERG MT ALLENDORF MD OUTKA DA
Citation: Mt. Schulberg et al., THE ADSORPTION OF HYDROGEN-CHLORIDE ON POLYCRYSTALLINE BETA-SILICON CARBIDE, Surface science, 341(3), 1995, pp. 262-272
THEORETICAL-STUDY OF THE THERMOCHEMISTRY OF MOLECULES IN THE SI-O-H SYSTEM
Authors: ALLENDORF MD MELIUS CF HO P ZACHARIAH MR
Citation: Md. Allendorf et al., THEORETICAL-STUDY OF THE THERMOCHEMISTRY OF MOLECULES IN THE SI-O-H SYSTEM, Journal of physical chemistry, 99(41), 1995, pp. 15285-15293
KINETICS AND THERMOCHEMISTRY OF SI(CH3)(3)- DIRECT DETERMINATION OF ASI-N BOND-ENERGY(NO REACTION )
Authors: KRASNOPEROV LN NIIRANEN JT GUTMAN D MELIUS CF ALLENDORF MD
Citation: Ln. Krasnoperov et al., KINETICS AND THERMOCHEMISTRY OF SI(CH3)(3)- DIRECT DETERMINATION OF ASI-N BOND-ENERGY(NO REACTION ), Journal of physical chemistry, 99(39), 1995, pp. 14347-14358
UNIMOLECULAR DECOMPOSITION OF METHYLTRICHLOROSILANE - RRKM CALCULATIONS
Authors: OSTERHELD TH ALLENDORF MD MELIUS CF
Citation: Th. Osterheld et al., UNIMOLECULAR DECOMPOSITION OF METHYLTRICHLOROSILANE - RRKM CALCULATIONS, Journal of physical chemistry, 98(28), 1994, pp. 6995-7003
A MODEL OF ELEMENTARY CHEMISTRY AND FLUID-MECHANICS IN THE COMBUSTIONOF HYDROGEN ON PLATINUM SURFACES
Authors: WARNATZ J ALLENDORF MD KEE RJ COLTRIN ME
Citation: J. Warnatz et al., A MODEL OF ELEMENTARY CHEMISTRY AND FLUID-MECHANICS IN THE COMBUSTIONOF HYDROGEN ON PLATINUM SURFACES, Combustion and flame, 96(4), 1994, pp. 393-406
DEPOSITION OF SILICON-CARBIDE USING THE CHEMICAL-VAPOR COMPOSITES PROCESS - PROCESS CHARACTERIZATION AND COMPARISON WITH RASSPVDN MODEL PREDICTIONS
Authors: ALLENDORF MD HURT RH YANG N REAGAN P ROBBINS M
Citation: Md. Allendorf et al., DEPOSITION OF SILICON-CARBIDE USING THE CHEMICAL-VAPOR COMPOSITES PROCESS - PROCESS CHARACTERIZATION AND COMPARISON WITH RASSPVDN MODEL PREDICTIONS, Journal of materials research, 8(7), 1993, pp. 1651-1665
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