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Authors: RICHTER HH AMINPUR MA ERZGRABER HB WOLFF A KRUGER D DEHOFF A REETZ M
Citation: Hh. Richter et al., SILICON DRY-ETCHING IN HYDROGEN IODIDE PLASMAS - SURFACE DIAGNOSTICS AND TECHNOLOGICAL APPLICATIONS, JPN J A P 1, 36(7B), 1997, pp. 4849-4853
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