Authors:
AUGUR RA
WOLTERS RAM
SCHMIDT W
DIRKS AG
KORDIC S
Citation: Ra. Augur et al., DIFFUSION AT THE AL AL OXIDE INTERFACE DURING ELECTROMIGRATION IN WIDE LINES/, Journal of applied physics, 79(6), 1996, pp. 3003-3010
Citation: Ag. Dirks et al., AL-SI-V AND AL-SI-V-PD FILMS AS ALTERNATIVES FOR AL-SI-CU INTERCONNECT - MICROSTRUCTURE AND ITS IMPACT ON RELIABILITY, Thin solid films, 246(1-2), 1994, pp. 164-171
Citation: Ag. Dirks et Ra. Augur, RELIABILITY AND MICROSTRUCTURE OF AL-SI-V-PD ALLOY-FILMS FOR USE IN ULTRALARGE SCALE INTEGRATION, Applied physics letters, 64(6), 1994, pp. 704-706