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Results: 3
Study of a mechanically clamped cryo-chuck device in a high density plasmafor deep anisotropic etching of silicon
Authors: Hibert, C Aachboun, S Boufnichel, M Ranson, P
Citation: C. Hibert et al., Study of a mechanically clamped cryo-chuck device in a high density plasmafor deep anisotropic etching of silicon, J VAC SCI A, 19(2), 2001, pp. 646-650
Cryogenic etching of deep narrow trenches in silicon
Authors: Aachboun, S Ranson, P Hilbert, C Boufnichel, M
Citation: S. Aachboun et al., Cryogenic etching of deep narrow trenches in silicon, J VAC SCI A, 18(4), 2000, pp. 1848-1852
Deep anisotropic etching of silicon
Authors: Aachboun, S Ranson, P
Citation: S. Aachboun et P. Ranson, Deep anisotropic etching of silicon, J VAC SCI A, 17(4), 1999, pp. 2270-2273
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