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Results:
1-19
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Results: 19
Authors:
Kukli, K
Aarik, J
Aidla, A
Forsgren, K
Sundqvist, J
Harsta, A
Uustare, T
Mandar, H
Kiisler, AA
Citation: K. Kukli et al., Atomic layer deposition of tantalum oxide thin films from iodide precursor, CHEM MATER, 13(1), 2001, pp. 122-128
Authors:
Schuisky, M
Aarik, J
Kukli, K
Aidla, A
Harsta, A
Citation: M. Schuisky et al., Atomic layer deposition of thin films using O-2 as oxygen source, LANGMUIR, 17(18), 2001, pp. 5508-5512
Authors:
Aarik, J
Karlis, J
Mandar, H
Uustare, T
Sammelselg, V
Citation: J. Aarik et al., Influence of structure development on atomic layer deposition of TiO2 thinfilms, APPL SURF S, 181(3-4), 2001, pp. 339-348
Authors:
Aarik, J
Aidla, A
Mandar, H
Uustare, T
Kukli, K
Schuisky, M
Citation: J. Aarik et al., Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures, APPL SURF S, 173(1-2), 2001, pp. 15-21
Authors:
Aarik, J
Aidla, A
Mandar, H
Uustare, T
Citation: J. Aarik et al., Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism, APPL SURF S, 172(1-2), 2001, pp. 148-158
Authors:
Kukli, K
Forsgren, K
Aarik, J
Uustare, T
Aidla, A
Niskanen, A
Ritala, M
Leskela, M
Harsta, A
Citation: K. Kukli et al., Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide, J CRYST GR, 231(1-2), 2001, pp. 262-272
Authors:
Kukli, K
Forsgren, K
Ritala, M
Leskela, M
Aarik, J
Harsta, A
Citation: K. Kukli et al., Dielectric properties of zirconium oxide grown by atomic layer deposition from iodide precursor, J ELCHEM SO, 148(12), 2001, pp. F227-F232
Authors:
Kukli, K
Aidla, A
Aarik, J
Schuisky, M
Harsta, A
Ritala, M
Leskela, M
Citation: K. Kukli et al., Real-time monitoring in atomic layer deposition of TiO2 from TiI4 and H2O-H2O2, LANGMUIR, 16(21), 2000, pp. 8122-8128
Authors:
Aarik, J
Aidla, A
Uustare, T
Ritala, M
Leskela, M
Citation: J. Aarik et al., Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process, APPL SURF S, 161(3-4), 2000, pp. 385-395
Authors:
Aarik, J
Aidla, A
Sammelselg, V
Uustare, T
Ritala, M
Leskela, M
Citation: J. Aarik et al., Characterization of titanium dioxide atomic layer growth from titanium ethoxide and water, THIN SOL FI, 370(1-2), 2000, pp. 163-172
Authors:
Sildos, I
Suisalu, A
Aarik, J
Sekiya, T
Kurita, S
Citation: I. Sildos et al., Self-trapped exciton emission in crystalline anatase, J LUMINESC, 87-9, 2000, pp. 290-292
Authors:
Aarik, J
Aidla, A
Mandar, H
Sammelselg, V
Citation: J. Aarik et al., Anomalous effect of temperature on atomic layer deposition of titanium dioxide, J CRYST GR, 220(4), 2000, pp. 531-537
Authors:
Aarik, J
Aidla, A
Mandar, H
Sammelselg, V
Uustare, T
Citation: J. Aarik et al., Texture development in nanocrystalline hafnium dioxide thin films grown byatomic layer deposition, J CRYST GR, 220(1-2), 2000, pp. 105-113
Authors:
Schuisky, M
Harsta, A
Aidla, A
Kukli, K
Kiisler, AA
Aarik, J
Citation: M. Schuisky et al., Atomic layer chemical vapor deposition of TiO2 - Low temperature epitaxy of rutile and anatase, J ELCHEM SO, 147(9), 2000, pp. 3319-3325
Authors:
Jansen, M
Bournes, P
Corvini, P
Fang, F
Finander, M
Hmelar, M
Johnston, T
Jordan, C
Nabiev, R
Nightingale, J
Widman, M
Asonen, H
Aarik, J
Salokatve, A
Nappi, J
Rakennus, K
Citation: M. Jansen et al., High performance laser diode bars with aluminum-free active regions, OPT EXPRESS, 4(1), 1999, pp. 3-11
Authors:
Sammelselg, V
Aarik, J
Aidla, A
Kasikov, A
Heikinheimo, E
Peussa, M
Niinisto, L
Citation: V. Sammelselg et al., Composition and thickness determination of thin oxide films: comparison ofdifferent programs and methods, J ANAL ATOM, 14(3), 1999, pp. 523-527
Authors:
Aarik, J
Aidla, A
Kiisler, AA
Uustare, T
Sammelselg, V
Citation: J. Aarik et al., Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films, THIN SOL FI, 340(1-2), 1999, pp. 110-116
Authors:
Repan, V
Laan, M
Paris, P
Aarik, J
Sammelselg, V
Citation: V. Repan et al., Negative coronas: Low current mode - Pulse mode transition, CZEC J PHYS, 49(2), 1999, pp. 217-224
Authors:
Suisalu, A
Aarik, J
Mandar, H
Sildos, I
Citation: A. Suisalu et al., Spectroscopic study of nanocrystalline TiO2 thin films grown by atomic layer deposition, THIN SOL FI, 336(1-2), 1998, pp. 295-298
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