Authors: Abraham-Shrauner, B

Citation: B. Abraham-shrauner, Plasma etch profiles of passivated open-area trenches, J VAC SCI B, 19(3), 2001, pp. 711-721

Authors: Chen, WJ Abraham-Shrauner, B Woodworth, JR

Citation: Wj. Chen et al., Model etch profiles for ion energy distribution functions in an inductively coupled plasma reactor, J VAC SCI B, 17(5), 1999, pp. 2061-2069

Authors: Abraham-Shrauner, B Nordheden, KJ Lee, YS

Citation: B. Abraham-shrauner et al., Model for etch depth dependence on GaAs via hole diameter, J VAC SCI B, 17(3), 1999, pp. 961-964

Authors: Abraham-Shrauner, B

Citation: B. Abraham-shrauner, Contact hole model for etch depth dependence, J VAC SCI B, 17(1), 1999, pp. 158-161

Authors: Abraham-Shrauner, B Jagannathan, N

Citation: B. Abraham-shrauner et N. Jagannathan, Modification of plasma-etched profiles by sputtering, IEEE PLAS S, 27(3), 1999, pp. 668-675

Authors: Leach, PGL Govinder, KS Abraham-Shrauner, B

Citation: Pgl. Leach et al., Symmetries of first integrals and their associated differential equations, J MATH ANAL, 235(1), 1999, pp. 58-83