Authors:
Akatsuka, M
Okui, M
Morimoto, N
Sueoka, K
Citation: M. Akatsuka et al., Effect of rapid thermal annealing on oxygen precipitation behavior in silicon wafers, JPN J A P 1, 40(5A), 2001, pp. 3055-3062
Citation: M. Akatsuka et K. Sueoka, Pinning effect of punched-out dislocations in carbon-, nitrogen- or boron-doped silicon wafers, JPN J A P 1, 40(3A), 2001, pp. 1240-1241
Authors:
Wakugawa, M
Nakamura, K
Akatsuka, M
Nakagawa, H
Tamaki, K
Citation: M. Wakugawa et al., Interferon-gamma-induced RANTES production by harman keratinocytes is enhanced by IL-1 beta, TNF-alpha, IL-4 and IL-13 and is inhibited by dexamethasone and tacrolimus, DERMATOLOGY, 202(3), 2001, pp. 239-245
Authors:
Wakugawa, M
Nakamura, K
Akatsuka, M
Kim, SS
Yamada, Y
Kawasaki, H
Tamaki, K
Furue, M
Citation: M. Wakugawa et al., Expression of CC chemokine receptor 3 on human keratinocytes in vivo and in vitro upregulation by RANTES, J DERMA SCI, 25(3), 2001, pp. 229-235
Citation: M. Akatsuka et al., Influences of inorganic fillers on curing reactions of epoxy resins initiated with a boron trifluoride amine complex, POLYMER, 42(7), 2001, pp. 3003-3007
Authors:
Farren, C
Akatsuka, M
Takezawa, Y
Itoh, Y
Citation: C. Farren et al., Thermal and mechanical properties of liquid crystalline epoxy resins as a function of mesogen concentration, POLYMER, 42(4), 2001, pp. 1507-1514
Citation: M. Akatsuka et al., Delamination mechanism of high-voltage coil insulators made from mice flakes and thermosetting epoxy resin, J APPL POLY, 79(12), 2001, pp. 2164-2169
Citation: M. Akatsuka et al., Classification of etch pits at silicon wafer surface using image-processing instrument, J CRYST GR, 210(1-3), 2000, pp. 366-369
Authors:
Sueoka, K
Akatsuka, M
Yonemura, M
Ono, T
Asayama, E
Katahama, H
Citation: K. Sueoka et al., Effect of heavy boron doping on oxygen precipitation in Czochralski silicon substrates of epitaxial wafers, J ELCHEM SO, 147(2), 2000, pp. 756-762
Authors:
Sueoka, K
Akatsuka, M
Katahama, H
Adachi, N
Citation: K. Sueoka et al., Investigation of the mechanical strength of hydrogen-annealed Czochralski silicon wafers, J ELCHEM SO, 146(1), 1999, pp. 364-366