Authors: Nelson, MW Schroeder, PG Schlaf, R Parkinson, BA Almgren, CW Erickson, AN

Citation: Mw. Nelson et al., Spatially resolved dopant profiling of patterned Si wafers by bias-appliedphase-imaging tapping-mode atomic force microscopy, APPL PHYS L, 74(10), 1999, pp. 1421-1423