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Results: 1-10 |
Results: 10

Authors: Lee, J Rovira, PI An, I Collins, RW
Citation: J. Lee et al., Alignment and calibration of the MgF2 biplate compensator for applicationsin rotating-compensator multichannel ellipsometry, J OPT SOC A, 18(8), 2001, pp. 1980-1985

Authors: Baulac, S An, I Brice, A Le Guern, E
Citation: S. Baulac et al., Epilepsy, febrile seizures and ion channels, M S-MED SCI, 17(10), 2001, pp. 999-1007

Authors: Lee, EM Sung, MG Lee, YM Sohn, YS Bak, HJ An, I Oh, HK
Citation: Em. Lee et al., Thickness reduction effect in a chemically amplified resist simulator, J KOR PHYS, 39(1), 2001, pp. 147-151

Authors: Sohn, YS Lee, EM Sung, MG Lee, YM Bak, HJ An, I Oh, HK
Citation: Ys. Sohn et al., Extraction of exposure parameters for 193-nm chemically amplified resist and its application to simulation, J KOR PHYS, 39(1), 2001, pp. 152-156

Authors: Lee, YM Sung, MG Lee, EM Sohn, YS An, I Oh, HK
Citation: Ym. Lee et al., Post exposure delay consideration in a 193-nm chemically amplified resist, J KOR PHYS, 38(3), 2001, pp. 255-258

Authors: Hong, S Bak, H An, I Kim, OK
Citation: S. Hong et al., Microstructural and electrical properties of BaxSr1-xTiO3 thin films on various electrodes, JPN J A P 1, 39(4A), 2000, pp. 1796-1800

Authors: Picard, F Baulac, S Kahane, P Hirsch, E Sebastianelli, R Thomas, P Vigevano, F Genton, P Guerrini, R Gericke, CA An, I Rudolf, G Herman, A Brice, A Marescaux, C LeGuern, E
Citation: F. Picard et al., Dominant partial epilepsies - A clinical, electrophysiological and geneticstudy of 19 European families, BRAIN, 123, 2000, pp. 1247-1262

Authors: An, I Oh, H
Citation: I. An et H. Oh, High speed spectroscopic ellipsometer for the monitoring of photoresist process, J KOR PHYS, 35, 1999, pp. S729-S733

Authors: Oh, HK Sohn, YS Sung, MG Lee, YM Lee, EM An, I
Citation: Hk. Oh et al., Post exposure bake effect in 193 nm chemically amplified resist, J KOR PHYS, 35, 1999, pp. S734-S737

Authors: Sohn, YS Sung, MG Lee, YM Lee, FM Oh, JK Byun, SH Jeong, YU Oh, HK An, I Lee, KS Park, IH Cho, JY Lee, SH
Citation: Ys. Sohn et al., Photoresist exposure parameter extraction from refractive index change during exposure, JPN J A P 1, 37(12B), 1998, pp. 6877-6883
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