AAAAAA
Results:
1-7
|
Results: 7
Authors:
Asmann, M
Cook, RF
Heberlein, JV
Pfender, E
Citation: M. Asmann et al., Chemical vapor deposition of an aluminum nitride-diamond composite in a triple torch plasma reactor, J MATER RES, 16(2), 2001, pp. 469-477
Authors:
Asmann, M
Wank, A
Kim, H
Heberlein, J
Pfender, E
Citation: M. Asmann et al., Characterization of the converging jet region in a triple torch plasma reactor, PLASMA CHEM, 21(1), 2001, pp. 37-63
Authors:
Wilden, J
Wank, A
Asmann, M
Heberlein, JVR
Boulos, MI
Gitzhofer, F
Citation: J. Wilden et al., Synthesis of Si-C-N coatings by thermal Plasmajet chemical vapour deposition applying liquid precursors, APPL ORGAN, 15(10), 2001, pp. 841-857
Authors:
Asmann, M
Borges, CFM
Heberlein, J
Pfender, E
Citation: M. Asmann et al., The effects of substrate rotation on thermal plasma chemical vapor deposition of diamond, SURF COAT, 142, 2001, pp. 724-732
Authors:
Asmann, M
Kolman, D
Heberlein, J
Pfender, E
Citation: M. Asmann et al., Experimental confirmation of thermal plasma CVD of diamond with liquid feedstock injection model, DIAM RELAT, 9(1), 2000, pp. 13-21
Authors:
Asmann, M
Heberlein, J
Pfender, E
Citation: M. Asmann et al., Use of liquid precursors for diamond chemical vapor deposition - The effects of mass transport and oxygen, PLASMA CHEM, 20(2), 2000, pp. 209-224
Authors:
Asmann, M
Heberlein, J
Pfender, E
Citation: M. Asmann et al., A review of diamond CVD utilizing halogenated precursors, DIAM RELAT, 8(1), 1999, pp. 1-16
Risultati:
1-7
|