Authors: YCKACHE K BOIVIN P BAIGET F RADJAA S AURIEL G SAGNES B OUALID J GLACHANT A

Citation: K. Yckache et al., RELIABILITY OF NITRIDED WET SILICON DIOXIDE THIN-FILMS IN WSI2 OR TASI2 POLYCIDE PROCESS - INFLUENCE OF THE NITRIDATION TEMPERATURE, Microelectronics and reliability, 38(6-8), 1998, pp. 937-942