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Results: 4
TETRAETHYLORTHOSILICATE REACTION-RATES ON SIO2 AT 1000 K - ZERO-ORDERDEPENDENCE ON HYDROXYL COVERAGE AND IMPLICATIONS FOR REACTIONS WITH 3-MEMBERED SILOXANE RINGS
Authors: BARTRAM ME MOFFAT HK
Citation: Me. Bartram et Hk. Moffat, TETRAETHYLORTHOSILICATE REACTION-RATES ON SIO2 AT 1000 K - ZERO-ORDERDEPENDENCE ON HYDROXYL COVERAGE AND IMPLICATIONS FOR REACTIONS WITH 3-MEMBERED SILOXANE RINGS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 872-878
COMPARISON OF BORANOL AND SILANOL REACTIVITIES IN BORON-DOPED SIO2 CHEMICAL-VAPOR-DEPOSITION FROM TRIMETHYL BORATE AND TETRAETHYL ORTHOSILICATE
Authors: BARTRAM ME MOFFAT HK
Citation: Me. Bartram et Hk. Moffat, COMPARISON OF BORANOL AND SILANOL REACTIVITIES IN BORON-DOPED SIO2 CHEMICAL-VAPOR-DEPOSITION FROM TRIMETHYL BORATE AND TETRAETHYL ORTHOSILICATE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1027-1031
NUCLEATION AND GROWTH OF AIN - SELF-LIMITING REACTIONS AND THE REGENERATION OF ACTIVE-SITES USING SEQUENTIAL EXPOSURES OF TRIMETHYLALUMINUMAND AMMONIA ON SILICA AT 600 K
Authors: BARTRAM ME MICHALSKE TA ROGERS JW PAINE RT
Citation: Me. Bartram et al., NUCLEATION AND GROWTH OF AIN - SELF-LIMITING REACTIONS AND THE REGENERATION OF ACTIVE-SITES USING SEQUENTIAL EXPOSURES OF TRIMETHYLALUMINUMAND AMMONIA ON SILICA AT 600 K, Chemistry of materials, 5(10), 1993, pp. 1424-1430
A NEW METHOD FOR PROMOTING PHOTORESIST ADHESION ON TUNGSTEN FILMS FORSELF-ALIGNED REFRACTORY GATES ON GAAS
Authors: BARTRAM ME HOWARD AJ BACA AG SHUL RJ RIEGER DJ
Citation: Me. Bartram et al., A NEW METHOD FOR PROMOTING PHOTORESIST ADHESION ON TUNGSTEN FILMS FORSELF-ALIGNED REFRACTORY GATES ON GAAS, Journal of the Electrochemical Society, 140(10), 1993, pp. 2998-3001
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