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Authors: WANG ZZ KWAN SL PEARSALL TP BOOTH JL BEARD BT JOHNSON SR
Citation: Zz. Wang et al., REAL-TIME, NONINVASIVE TEMPERATURE CONTROL OF WAFER PROCESSING BASED ON DIFFUSIVE REFLECTANCE SPECTROSCOPY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(1), 1997, pp. 116-121

Authors: BOOTH JL BEARD BT STEVENS JE BLAIN MG MEISENHEIMER TL
Citation: Jl. Booth et al., IN-SITU WAFER TEMPERATURE MONITORING OF SILICON ETCHING USING DIFFUSE-REFLECTANCE SPECTROSCOPY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2356-2360

Authors: PEARSALL TP SABAN SR BOOTH J BEARD BT JOHNSON SR
Citation: Tp. Pearsall et al., PRECISION OF NONINVASIVE TEMPERATURE-MEASUREMENT BY DIFFUSE-REFLECTANCE SPECTROSCOPY, Review of scientific instruments, 66(10), 1995, pp. 4977-4980
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