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Authors: YASUDA H ARAI S KAI J OOAE Y ABE T TAKAHASHI Y HUEKI S MARUYAMA S SAGO S BETSUI K
Citation: H. Yasuda et al., FAST-ELECTRON BEAM LITHOGRAPHY SYSTEM WITH 1024 BEAMS INDIVIDUALLY CONTROLLED BY BLANKING APERTURE ARRAY, JPN J A P 1, 32(12B), 1993, pp. 6012-6017
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