Authors: BOUKEZZATA M BIROUK B MANSOUR F BIELLEDASPET D

Citation: M. Boukezzata et al., STRUCTURAL AND ELECTRICAL CHANGES IN POLYCRYSTALLINE SILICON THIN-FILMS THAT ARE HEAVILY IN-SITU BORON-DOPED AND THERMALLY OXIDIZED WITH DRY OXYGEN, CHEMICAL VAPOR DEPOSITION, 3(5), 1997, pp. 271-279