Authors:
BOUKEZZATA M
BIROUK B
MANSOUR F
BIELLEDASPET D
Citation: M. Boukezzata et al., STRUCTURAL AND ELECTRICAL CHANGES IN POLYCRYSTALLINE SILICON THIN-FILMS THAT ARE HEAVILY IN-SITU BORON-DOPED AND THERMALLY OXIDIZED WITH DRY OXYGEN, CHEMICAL VAPOR DEPOSITION, 3(5), 1997, pp. 271-279