Authors:
BOEBEL FG
MOLLER H
HERTEL B
GROTHE H
SCHRAUD G
SCHRODER S
CHOW P
Citation: Fg. Boebel et al., IN-SITU FILM THICKNESS AND TEMPERATURE CONTROL OF MOLECULAR-BEAM EPITAXY GROWTH BY PYROMETRIC INTERFEROMETRY, Journal of crystal growth, 150(1-4), 1995, pp. 54-61
Citation: Fg. Boebel et H. Moller, SIMULTANEOUS INSITU MEASUREMENT OF FILM THICKNESS AND TEMPERATURE BY USING MULTIPLE WAVELENGTHS PYROMETRIC INTERFEROMETRY (MWPI), IEEE transactions on semiconductor manufacturing, 6(2), 1993, pp. 112-118
Citation: H. Grothe et Fg. Boebel, INSITU CONTROL OF GA(AL)AS MBE LAYERS BY PYROMETRIC INTERFEROMETRY, Journal of crystal growth, 127(1-4), 1993, pp. 1010-1013