Authors:
GIROULTMATLAKOWSKI G
CHARLES C
DURANDET A
BOSWELL RW
ARMAND S
PERSING HM
PERRY AJ
LLOYD PD
HYDE SR
BOGSANYI D
Citation: G. Giroultmatlakowski et al., DEPOSITION OF SILICON DIOXIDE FILMS USING THE HELICON DIFFUSION REACTOR FOR INTEGRATED-OPTICS APPLICATIONS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(5), 1994, pp. 2754-2761