Authors: ANGERMEIER D MONNA R BOURDAIS S SLAOUI A MULLER JC

Citation: D. Angermeier et al., THIN-FILM SILICON FORMATION ON FOREIGN SUBSTRATES BY RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION FOR PHOTOVOLTAIC APPLICATION, Progress in photovoltaics, 6(4), 1998, pp. 219-231