Authors:
SIMON G
HAGHIRIGOSNET AM
BOURNEIX J
DECANINI D
CHEN Y
ROUSSEAUX F
LAUNOIS H
VIDAL B
Citation: G. Simon et al., SUB-20 NM X-RAY NANOLITHOGRAPHY USING CONVENTIONAL MASK TECHNOLOGIES ON MONOCHROMATIZED SYNCHROTRON-RADIATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2489-2494
Authors:
RAVET MF
ROUSSEAUX F
CHEN Y
HAGHIRIGOSNET AM
CARCENAC F
DECANINI D
BOURNEIX J
LAUNOIS H
BACHMANN PK
LADE H
WIECHERT DU
WILSON H
Citation: Mf. Ravet et al., EVALUATION OF A DIAMOND-BASED X-RAY MASK FOR HIGH-RESOLUTION X-RAY PROXIMITY LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3055-3060
Authors:
JEAN A
ELKHAKANI MA
CHAKER M
GAT E
DODIER J
PAPADOPOULLOS A
LAFONTAINE H
PEPIN H
KIEFFER JC
RAVET MF
MADOURI A
BOURNEIX J
ROUSSEAUX F
GUJRATHI SC
Citation: A. Jean et al., MECHANICAL-PROPERTIES OF SILICON-CARBIDE FILMS FOR X-RAY-LITHOGRAPHY APPLICATION, Canadian journal of physics, 70(10-11), 1992, pp. 834-837