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Results: 1-13 |
Results: 13
QCD STRUCTURE OF MULTIPARTICLE PRODUCTION - QUARK AND GLUON JETS
Authors: BROGUEIRA P DEDEUS JD DASILVA IP
Citation: P. Brogueira et al., QCD STRUCTURE OF MULTIPARTICLE PRODUCTION - QUARK AND GLUON JETS, EUROPEAN PHYSICAL JOURNAL C-PARTICLES AND FIELDS, 2(2), 1998, pp. 325-328
MOBILITY-LIFETIME PRODUCT IN MICRODOPED AMORPHOUS-SILICON DEPOSITED BY HOT-WIPE CHEMICAL-VAPOR-DEPOSITION
Authors: CONDE JP CASTANHA R BROGUEIRA P CHU V
Citation: Jp. Conde et al., MOBILITY-LIFETIME PRODUCT IN MICRODOPED AMORPHOUS-SILICON DEPOSITED BY HOT-WIPE CHEMICAL-VAPOR-DEPOSITION, Journal of non-crystalline solids, 230, 1998, pp. 225-228
AMORPHOUS AND MICROCRYSTALLINE SILICON DEPOSITED BY LOW-POWER ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION
Authors: CONDE JP SCHOTTEN V AREKAT S BROGUEIRA P SOUSA R CHU V
Citation: Jp. Conde et al., AMORPHOUS AND MICROCRYSTALLINE SILICON DEPOSITED BY LOW-POWER ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 36(1A), 1997, pp. 38-49
AMORPHOUS AND MICROCRYSTALLINE SILICON FILMS OBTAINED BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION USING HIGH FILAMENT TEMPERATURES BETWEEN 1900 AND 2500-DEGREES-C
Authors: CONDE JP BROGUEIRA P CHU V
Citation: Jp. Conde et al., AMORPHOUS AND MICROCRYSTALLINE SILICON FILMS OBTAINED BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION USING HIGH FILAMENT TEMPERATURES BETWEEN 1900 AND 2500-DEGREES-C, Philosophical magazine. B. Physics of condensed matter. Statistical mechanics, electronic, optical and magnetic, 76(3), 1997, pp. 299-308
DOPING OF AMORPHOUS AND MICROCRYSTALLINE SILICON FILMS DEPOSITED BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION USING PHOSPHINE AND TRIMETHYLBORON
Authors: BROGUEIRA P CHU V FERRO AC CONDE JP
Citation: P. Brogueira et al., DOPING OF AMORPHOUS AND MICROCRYSTALLINE SILICON FILMS DEPOSITED BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION USING PHOSPHINE AND TRIMETHYLBORON, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(6), 1997, pp. 2968-2982
IMPROVED MOBILITY OF AMORPHOUS-SILICON THIN-FILM TRANSISTORS DEPOSITED BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION ON GLASS SUBSTRATES
Authors: CHU V JAREGO J SILVA H SILVA T REISSNER M BROGUEIRA P CONDE JP
Citation: V. Chu et al., IMPROVED MOBILITY OF AMORPHOUS-SILICON THIN-FILM TRANSISTORS DEPOSITED BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION ON GLASS SUBSTRATES, Applied physics letters, 70(20), 1997, pp. 2714-2716
INFORMATION ENTROPY AND PARTICLE-PRODUCTION IN BRANCHING-PROCESSES
Authors: BROGUEIRA P DEDEUS JD DASILVA IP
Citation: P. Brogueira et al., INFORMATION ENTROPY AND PARTICLE-PRODUCTION IN BRANCHING-PROCESSES, Physical review. D. Particles and fields, 53(9), 1996, pp. 5283-5285
DISCRETE BRANCHING-PROCESSES, QCD AND MULTIPARTICLE DISTRIBUTIONS
Authors: BROGUEIRA P DEDEUS JD DASILVA IP
Citation: P. Brogueira et al., DISCRETE BRANCHING-PROCESSES, QCD AND MULTIPARTICLE DISTRIBUTIONS, Physics letters. Section B, 389(3), 1996, pp. 605-608
PHOTOCONDUCTIVE ANALYSIS OF DEFECT DENSITY OF HYDROGENATED AMORPHOUS-SILICON DURING ROOM-TEMPERATURE PLASMA POSTHYDROGENATION, LIGHT SOAKING, AND THERMAL ANNEALING
Authors: CONDO JP GONCALVES M BROGUEIRA P SCHOTTEN V CHU V
Citation: Jp. Condo et al., PHOTOCONDUCTIVE ANALYSIS OF DEFECT DENSITY OF HYDROGENATED AMORPHOUS-SILICON DURING ROOM-TEMPERATURE PLASMA POSTHYDROGENATION, LIGHT SOAKING, AND THERMAL ANNEALING, Physical review. B, Condensed matter, 53(4), 1996, pp. 1886-1890
AMORPHOUS AND MICROCRYSTALLINE SILICON FILMS DEPOSITED BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION AT FILAMENT TEMPERATURES BETWEEN 1500-DEGREES-C AND 1900-DEGREES-C
Authors: BROGUEIRA P CONDE JP AREKAT S CHU V
Citation: P. Brogueira et al., AMORPHOUS AND MICROCRYSTALLINE SILICON FILMS DEPOSITED BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION AT FILAMENT TEMPERATURES BETWEEN 1500-DEGREES-C AND 1900-DEGREES-C, Journal of applied physics, 79(11), 1996, pp. 8748-8760
LOW FILAMENT TEMPERATURE DEPOSITION OF A-SI-H BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION
Authors: BROGUEIRA P CONDE JP AREKAT S CHU V
Citation: P. Brogueira et al., LOW FILAMENT TEMPERATURE DEPOSITION OF A-SI-H BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION, Journal of applied physics, 78(6), 1995, pp. 3776-3783
TRANSPORT AND PHOTOLUMINESCENCE OF HYDROGENATED AMORPHOUS SILICON-CARBON ALLOYS
Authors: CHU V CONDE JP JAREGO J BROGUEIRA P RODRIGUEZ J BARRADAS N SOARES JC
Citation: V. Chu et al., TRANSPORT AND PHOTOLUMINESCENCE OF HYDROGENATED AMORPHOUS SILICON-CARBON ALLOYS, Journal of applied physics, 78(5), 1995, pp. 3164-3173
RESPONSE-TIME MEASUREMENTS IN MICROCRYSTALLINE SILICON
Authors: SCHWARZ R WANG F GREBNER S FISCHER T KOYNOV S CHU V BROGUEIRA P CONDE J
Citation: R. Schwarz et al., RESPONSE-TIME MEASUREMENTS IN MICROCRYSTALLINE SILICON, Journal of non-crystalline solids, 166, 1993, pp. 477-480
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