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BRUNGER WH
BUCHMANN LM
NAUMANN F
FRIEDRICH D
FINKELSTEIN W
MOHONDRO R
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CHALUPKA A
FEGERL J
FISCHER R
LAMMER G
LOSCHNER H
MALEK L
NOWAK R
STENGL G
VONACH H
WOLF P
BRUNGER WH
BUCHMANN LM
TORKLER M
CEKAN E
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PASCHKE F
STANGL G
THALINGER F
BERRY IL
HARRIOTT LR
FINKELSTEIN W
HILL RW
Citation: E. Hammel et al., EXPERIMENTAL INVESTIGATION OF STOCHASTIC SPACE-CHARGE EFFECTS ON PATTERN RESOLUTION IN ION PROJECTION LITHOGRAPHY SYSTEMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3533-3538
Authors:
BRUNGER WH
BUCHMANN LM
TORKLER MA
FINKELSTEIN W
Citation: Wh. Brunger et al., ION PROJECTION LITHOGRAPHY OVER WAFER TOPOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3547-3549
Authors:
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CHLEBEK J
WEISS M
REIMER K
OERTEL H
BRUNGER WH
Citation: Kt. Kohlmannvonplaten et al., RESOLUTION LIMITS IN ELECTRON-BEAM-INDUCED TUNGSTEN DEPOSITION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2219-2223
Authors:
BRUNGER WH
BLASCHKE J
TORKLER M
BUCHMANN LM
Citation: Wh. Brunger et al., EDGE ROUGHNESS OF A 200-NM PITCH RESIST PATTERN FABRICATED BY ION PROJECTION LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2404-2408