Authors: BUCHKREMERHERMANNS H REN H KOHLSCHEIN G WEISS H

Citation: H. Buchkremerhermanns et al., NUCLEATION AND EARLY GROWTH OF CVD DIAMOND ON SILICON-NITRIDE, Surface & coatings technology, 98(1-3), 1998, pp. 1038-1046

Authors: BUCHKREMERHERMANNS H REN H UTSCH J WEISS H

Citation: H. Buchkremerhermanns et al., OPTIMIZATION OF MW-PACVD DIAMOND DEPOSITION PARAMETERS FOR HIGH NUCLEATION DENSITY AND GROWTH-RATE ON SI3N4 SUBSTRATE, DIAMOND AND RELATED MATERIALS, 6(2-4), 1997, pp. 411-416

Authors: BUCHKREMERHERMANNS H LONG C WEISS H

Citation: H. Buchkremerhermanns et al., ECR PLASMA POLISHING OF CVD DIAMOND FILMS, DIAMOND AND RELATED MATERIALS, 5(6-8), 1996, pp. 845-849

Authors: BUCHKREMERHERMANNS H REN H WEISS H

Citation: H. Buchkremerhermanns et al., OPTIMIZATION OF DIAMOND NUCLEATION AND GROWTH USING MW-PACVD METHOD, DIAMOND AND RELATED MATERIALS, 5(3-5), 1996, pp. 312-316

Authors: BUCHKREMERHERMANNS H REN H WEISS H

Citation: H. Buchkremerhermanns et al., A COMBINED MW ECR-PACVD APPARATUS FOR THE DEPOSITION OF DIAMOND AND OTHER HARD COATINGS/, Surface & coatings technology, 74-5(1-3), 1995, pp. 215-220