Citation: Wh. Semke et al., Mechanical analysis of the PLASMAX particle removal process for optical and next-generation lithography masks, J VAC SCI B, 18(6), 2000, pp. 3221-3226
Authors:
Doughty, C
Knick, DC
Bailey, JB
Spencer, JE
Citation: C. Doughty et al., Silicon nitride films deposited at substrate temperatures < 100 degrees C in a permanent magnet electron cyclotron resonance plasma, J VAC SCI A, 17(5), 1999, pp. 2612-2618