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Ellipsometric investigation of nucleation sites for chemical vapor deposition of Si on SiO2 and Si3N4 surfaces
Authors:
Basa, C Irene, EA
Citation:
C. Basa et Ea. Irene, Ellipsometric investigation of nucleation sites for chemical vapor deposition of Si on SiO2 and Si3N4 surfaces, J VAC SCI A, 17(3), 1999, pp. 817-822
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