Authors:
Edwards, NV
Bremser, MD
Batchelor, AD
Buyanova, IA
Madsen, LD
Yoo, SD
Welhkamp, T
Wilmers, K
Cobet, C
Esser, N
Davis, RF
Aspnes, DE
Monemar, B
Citation: Nv. Edwards et al., Optical characterization of wide bandgap semiconductors, THIN SOL FI, 364(1-2), 2000, pp. 98-106
Authors:
O'Neil, PA
Ozturk, MC
Batchelor, AD
Venables, D
Xu, MM
Maher, DM
Citation: Pa. O'Neil et al., Growth of selective silicon epitaxy using disilane and chlorine on heavilyimplanted substrates - I. Role of implanted BF2, J ELCHEM SO, 146(8), 1999, pp. 3070-3078
Authors:
O'Neil, PA
Ozturk, MC
Batchelor, AD
Venables, D
Maher, DM
Citation: Pa. O'Neil et al., Growth of selective silicon epitaxy using disilane and chlorine on heavilyimplanted substrates - II. Role of implanted arsenic, J ELCHEM SO, 146(8), 1999, pp. 3079-3086
Authors:
O'Neil, PA
Ozturk, MC
Batchelor, AD
Xu, MM
Maher, DM
Citation: Pa. O'Neil et al., Quality of selective silicon epitaxial films deposited using disilane and chlorine, J ELCHEM SO, 146(6), 1999, pp. 2337-2343
Authors:
O'Neil, PA
Ozturk, MC
Batchelor, AD
Xu, MM
Maher, DM
Citation: Pa. O'Neil et al., Effects of oxygen during selective silicon epitaxial growth using disilaneand chlorine, J ELCHEM SO, 146(6), 1999, pp. 2344-2352