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Citation: K. Beekmann et al., Properties of posttreated low kappa flowfill (TM) films and their stability after etch, resist and polymer strip processes, MICROEL ENG, 55(1-4), 2001, pp. 73-79

Authors: Hartmannsgruber, E Zwicker, G Beekmann, K

Citation: E. Hartmannsgruber et al., A selective CMP process for stacked low-k CVD oxide films, MICROEL ENG, 50(1-4), 2000, pp. 53-58