AAAAAA
Results:
1-9
|
Results: 9
Authors:
Schuster, J
Marte, A
Amtage, S
Sang, B
Rempe, G
Beijerinck, HCW
Citation: J. Schuster et al., Avalanches in a Bose-Einstein condensate - art. no. 170404, PHYS REV L, 8717(17), 2001, pp. 0404
Authors:
Beijerinck, HCW
Citation: Hcw. Beijerinck, Heating rates in collisionally opaque alkali-metal atom traps: Role of secondary collisions - art. no. 063614, PHYS REV A, 6206(6), 2000, pp. 3614
Rigorous calculation of heating in alkali-metal traps by background gas collisions - art. no. 033606
Authors:
Beijerinck, HCW
Citation: Hcw. Beijerinck, Rigorous calculation of heating in alkali-metal traps by background gas collisions - art. no. 033606, PHYS REV A, 6103(3), 2000, pp. 3606
Authors:
Beijerinck, HCW
Vredenbregt, EJD
Stas, RJW
Doery, MR
Tempelaars, JGC
Citation: Hcw. Beijerinck et al., Prospects for Bose-Einstein condensation of metastable neon atoms - art. no. 023607, PHYS REV A, 6102(2), 2000, pp. 3607
Authors:
Sebel, PGM
Hermans, LJF
Beijerinck, HCW
Citation: Pgm. Sebel et al., Reaction layer dynamics in ion-assisted Si/XeF2 etching: Temperature dependence, J VAC SCI A, 18(6), 2000, pp. 2759-2769
Authors:
Sebel, PGM
Hermans, LJF
Beijerinck, HCW
Citation: Pgm. Sebel et al., Etching of Si through a thick condensed XeF2 layer, J VAC SCI A, 18(5), 2000, pp. 2090-2097
Authors:
Knops, RMS
Koolen, AEA
Beijerinck, HCW
van Leeuwen, KAH
Citation: Rms. Knops et al., Design and construction of a high-precision atomic beam machine for quantum optics and atom optics experiments, LASER PHYS, 9(1), 1999, pp. 286-292
Authors:
Sebel, PGM
Hermans, LJF
Beijerinck, HCW
Citation: Pgm. Sebel et al., Reaction layer dynamics in ion-assisted Si/XeF2 etching: Ion flux dependence, J VAC SCI A, 17(6), 1999, pp. 3368-3378
Authors:
Sebel, PGM
Hermans, LJF
Beijerinck, HCW
Citation: Pgm. Sebel et al., Silicon etch rate enhancement by traces of metal, J VAC SCI A, 17(3), 1999, pp. 755-762
Risultati:
1-9
|