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Results: 1-11 |
Results: 11

Authors: Ueda, M Berni, LA Rossi, JO Barroso, JJ Gomes, GF Beloto, AF Abramof, E
Citation: M. Ueda et al., Plasma immersion ion implantation experiments at the Instituto Nacional dePesquisas Espaciais (INPE), Brazil, SURF COAT, 136(1-3), 2001, pp. 28-31

Authors: Ueda, M Reuther, H Gunzel, R Beloto, AF Abramof, E Berni, LA
Citation: M. Ueda et al., High dose nitrogen and carbon shallow implantation in Si by plasma immersion ion implantation, NUCL INST B, 175, 2001, pp. 715-720

Authors: Monteiro, MJR Machida, M Daltrini, AM Berni, LA
Citation: Mjr. Monteiro et al., Comparison of two multipass configurations for scattered light amplification, BRAZ J PHYS, 31(3), 2001, pp. 502-506

Authors: Abramof, E Beloto, AF Ueda, M Gomes, GF Berni, LA Reuther, H
Citation: E. Abramof et al., Analysis of X-ray rocking curves in (001) silicon crystals implanted with nitrogen by plasma immersion ion implantation, NUCL INST B, 161, 2000, pp. 1054-1057

Authors: Ueda, M Gomes, GF Berni, LA Rossi, JO Barroso, JJ Beloto, AF Abramof, E Reuther, H
Citation: M. Ueda et al., Plasma immersion ion implantation using a glow discharge source with controlled plasma potential, NUCL INST B, 161, 2000, pp. 1064-1068

Authors: Berni, LA Ueda, M Gomes, GF Beloto, AF Reuther, H
Citation: La. Berni et al., Experimental results of a dc glow discharge source with controlled plasma floating potential for plasma immersion ion implantation, J PHYS D, 33(13), 2000, pp. 1592-1595

Authors: Mirabella, C Ndisang, JF Berni, LA Gai, P Masini, E Mannaioni, PF
Citation: C. Mirabella et al., Modulation of the immunological activation of human basophils by carbon monoxide, INFLAMM RES, 48, 1999, pp. S11-S12

Authors: Mirabella, C Baronti, R Berni, LA Gai, P Ndisang, JF Masini, E Mannaioni, PF
Citation: C. Mirabella et al., Hemin and carbon monoxide modulate the immunological response of human basophils, INT A AL IM, 118(2-4), 1999, pp. 259-260

Authors: Beloto, AF Abramof, E Ueda, M Berni, LA Gomes, GF
Citation: Af. Beloto et al., Plasma ion implantation of nitrogen into silicon: High resolution x-ray diffraction, BRAZ J PHYS, 29(4), 1999, pp. 768-770

Authors: Ueda, M Berni, LA Gomes, GF Beloto, AF Abramof, E Reuther, H
Citation: M. Ueda et al., Application of a dc glow discharge source with controlled plasma potentialin plasma immersion ion implantation, J APPL PHYS, 86(9), 1999, pp. 4821-4824

Authors: Campos, DO Berni, LA Machida, M Moshkalyov, SA
Citation: Do. Campos et al., Low-angle Thomson scattering experiment for determination of plasma electron density and temperature, ASTRO SP SC, 256(1-2), 1998, pp. 437-441
Risultati: 1-11 |