Authors: Mikhaelashvili, V Betzer, Y Prudnikov, I Orenstein, M Ritter, D Eisenstein, G

Citation: V. Mikhaelashvili et al., Electrical characteristics of metal-dielectric-metal and metal-dielectric-semiconductor structures based on electron beam evaporated Y2O3, Ta2O5 and Al2O3 thin film, J APPL PHYS, 84(12), 1998, pp. 6747-6752