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Results: 1-2 |
Results: 2
Effect of capacitive coupling on inductively coupled fluorocarbon plasma processing
Authors: Schaepkens, M Rueger, NR Beulens, JJ Li, X Standaert, TEFM Matsuo, PJ Oehrlein, GS
Citation: M. Schaepkens et al., Effect of capacitive coupling on inductively coupled fluorocarbon plasma processing, J VAC SCI A, 17(6), 1999, pp. 3272-3280
Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor
Authors: Rueger, NR Doemling, MF Schaepkens, M Beulens, JJ Standaert, TEFM Oehrlein, GS
Citation: Nr. Rueger et al., Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor, J VAC SCI A, 17(5), 1999, pp. 2492-2502
Risultati: 1-2 |