Authors: Tedesco, S Mourier, T Dal'zotto, B McDougall, A Blanc-Coquant, S Quere, Y Paniez, PJ Mortini, B

Citation: S. Tedesco et al., Resist processes for hybrid (electron-beam deep ultraviolet) lithography, J VAC SCI B, 16(6), 1998, pp. 3676-3683