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Results: 1-25 | 26-27 |
Results: 26-27/27
The interface formation of copper and low dielectric constant fluoro-polymer: Plasma surface modification and its effect on copper diffusion
Authors: Du, M Opila, RL Donnelly, VM Sapjeta, J Boone, T
Citation: M. Du et al., The interface formation of copper and low dielectric constant fluoro-polymer: Plasma surface modification and its effect on copper diffusion, J APPL PHYS, 85(3), 1999, pp. 1496-1502
Behavior of molybdenum in silicon evaluated for integrated circuit processing
Authors: Benton, JL Jacobson, DC Jackson, B Johnson, JA Boone, T Eaglesham, DJ Stevie, FA Becerro, J
Citation: Jl. Benton et al., Behavior of molybdenum in silicon evaluated for integrated circuit processing, J ELCHEM SO, 146(5), 1999, pp. 1929-1933
Risultati: 1-25 | 26-27 |