Authors: Borst, CL Korthuis, V Shinn, GB Luttmer, JD Gutmann, RJ Gill, WN

Citation: Cl. Borst et al., Chemical-mechanical polishing of SiOC organosilicate glasses: the effect of film carbon content, THIN SOL FI, 385(1-2), 2001, pp. 281-292

Authors: Thakurta, DG Borst, CL Schwendeman, DW Gutmann, RJ Gill, WN

Citation: Dg. Thakurta et al., Three-dimensional chemical mechanical planarization slurry flow model based on lubrication theory, J ELCHEM SO, 148(4), 2001, pp. G207-G214

Authors: Thakurta, DG Borst, CL Schwendeman, DW Gutmann, RJ Gill, WN

Citation: Dg. Thakurta et al., Pad porosity, compressibility and slurry delivery effects in chemical-mechanical planarization: modeling and experiments, THIN SOL FI, 366(1-2), 2000, pp. 181-190

Authors: Borst, CL Thakurta, DG Gill, WN Gutmann, RJ

Citation: Cl. Borst et al., Chemical mechanical polishing mechanisms of low dielectric constant polymers in copper slurries, J ELCHEM SO, 146(11), 1999, pp. 4309-4315