Authors: Hibert, C Aachboun, S Boufnichel, M Ranson, P

Citation: C. Hibert et al., Study of a mechanically clamped cryo-chuck device in a high density plasmafor deep anisotropic etching of silicon, J VAC SCI A, 19(2), 2001, pp. 646-650

Authors: Aachboun, S Ranson, P Hilbert, C Boufnichel, M

Citation: S. Aachboun et al., Cryogenic etching of deep narrow trenches in silicon, J VAC SCI A, 18(4), 2000, pp. 1848-1852

Authors: Stoffels, WW Stoffels, E Swinkels, GHPM Boufnichel, M Kroesen, GMW

Citation: Ww. Stoffels et al., Etching a single micrometer-size particle in a plasma, PHYS REV E, 59(2), 1999, pp. 2302-2304