Citation: Xy. Guo et P. Brault, Early stages of silicon nitride film growth studied by molecular dynamics simulations, SURF SCI, 488(1-2), 2001, pp. 133-140
Authors:
Thomann, AL
Charles, C
Cherradi, N
Brault, P
Citation: Al. Thomann et al., Electrical characterization of a dc secondary discharge created during plasma sputtering deposition of palladium thin films, PLASMA SOUR, 9(2), 2000, pp. 176-182
Authors:
Vantelon, JM
Koscielny, S
Brault, P
Bourhis, JH
Ribrag, V
Pico, J
Fenaux, P
Munck, JN
Citation: Jm. Vantelon et al., Scoring system for the prediction of successful peripheral blood stem cell(PBSC) collection in non-Hodgkin's lymphoma (NHL): application in clinicalpractice, BONE MAR TR, 25(5), 2000, pp. 495-499
Authors:
Berthet, A
Thomann, AL
Aires, FJCS
Brun, M
Deranlot, C
Bertolini, JC
Rozenbaum, JP
Brault, P
Andreazza, P
Citation: A. Berthet et al., Comparison of Pd/(bulk SiC) catalysts prepared by atomic beam deposition and plasma sputtering deposition: Characterization and catalytic properties, J CATALYSIS, 190(1), 2000, pp. 49-59