Authors: Milne, WI Teo, KBK Chhowalla, M Amaratunga, GAJ Yuan, J Robertson, J Legagneux, P Pirio, G Pribat, D Bouzehouane, K Bruenger, W Trautmann, C

Citation: Wi. Milne et al., Carbon films for use as the electron source in a parallel e-beam lithography system, NEW DIAM FR, 11(4), 2001, pp. 235-247

Authors: Szmanda, CR Brainard, RL Mackevich, JF Awaji, A Tanaka, T Yamada, Y Bohland, J Tedesco, S Dal'Zotto, B Bruenger, W Torkler, M Fallmann, W Loeschner, H Kaesmaier, R Nealey, PM Pawloski, AR

Citation: Cr. Szmanda et al., Measuring acid generation efficiency in chemically amplified resists with all three beams, J VAC SCI B, 17(6), 1999, pp. 3356-3361

Authors: Lee, Y Gough, RA Leung, KN Vujic, J Williams, MD Zahir, N Fallman, W Tockler, M Bruenger, W

Citation: Y. Lee et al., Plasma source for ion and electron beam lithography, J VAC SCI B, 16(6), 1998, pp. 3367-3369