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Results:
1-7
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Results: 7
Authors:
Hofrichter, A
Constantinescu, A
Benayoun, S
Bulkin, P
Drevillon, B
Citation: A. Hofrichter et al., Study of the mechanical behavior of plasma-deposited silica films on polycarbonate and steel, J VAC SCI A, 18(4), 2000, pp. 2012-2016
Authors:
Heitz, T
Hofrichter, A
Bulkin, P
Drevillon, B
Citation: T. Heitz et al., Real time control of plasma deposited optical filters by multiwavelength ellipsometry, J VAC SCI A, 18(4), 2000, pp. 1303-1307
Authors:
Brenot, R
Drevillon, B
Bulkin, P
Roca i Cabarrocas, P
Vanderhaghen, R
Citation: R. Brenot et al., Process monitoring of semiconductor thin films and interfaces by spectroellipsometry, APPL SURF S, 154, 2000, pp. 283-290
Authors:
Hofrichter, A
Bulkin, P
Drevillon, B
Citation: A. Hofrichter et al., In situ spectroellipsometric analysis of plasma treatments of polymers forthe adhesion improvement of silica thin films, VIDE, 54(294), 1999, pp. 393-397
Authors:
Hofrichter, A
Bulkin, P
Drevillon, B
Citation: A. Hofrichter et al., Plasma enhanced chemical vapour deposition of SiOxNy in an integrated distributed electron cyclotron resonance reactor, APPL SURF S, 142(1-4), 1999, pp. 447-450
Authors:
Bulkin, P
Hofrichter, A
Brenot, R
Drevillon, B
Citation: P. Bulkin et al., Deposition of microcrystalline silicon in an integrated distributed electron cyclotron resonance PECVD reactor, THIN SOL FI, 337(1-2), 1999, pp. 37-40
Authors:
Cabarrocas, PRI
Brenot, R
Bulkin, P
Vanderhaghen, R
Drevillon, B
French, I
Citation: Pri. Cabarrocas et al., Stable microcrystalline silicon thin-film transistors produced by the layer-by-layer technique, J APPL PHYS, 86(12), 1999, pp. 7079-7082
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1-7
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