Authors: CALLEGARI AC BABICH K PURUSHOTHAMAN S MANSFIELD S FERGUSON R WONG A ADAIR W OGRADY D CHAO V

Citation: Ac. Callegari et al., LITHOGRAPHIC EVALUATION OF A DUV CARBON ATTENUATED PHASE-SHIFT MASK, Microelectronic engineering, 42, 1998, pp. 107-110

Authors: CALLEGARI AC CLEARFIELD HM FURMAN BK GRAHAM TG NEUGROSCHL D PURUSHOTHAMAN S

Citation: Ac. Callegari et al., ADHESION DURABILITY OF TANTALUM BPDA-PDA POLYIMIDE INTERFACES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(1), 1994, pp. 185-191

Authors: SUN JZ GALLAGHER WJ CALLEGARI AC FOGLIETTI V KOCH RH

Citation: Jz. Sun et al., IMPROVED PROCESS FOR HIGH-T(C) SUPERCONDUCTING STEP-EDGE JUNCTIONS, Applied physics letters, 63(11), 1993, pp. 1561-1563