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Results: 1-25/77
Authors:
HECTOR S
POL V
KHAN M
BOLLEPALLI S
CERRINA F
Citation: S. Hector et al., INVESTIGATION OF MASK PATTERN PROXIMITY CORRECTION TO REDUCE IMAGE SHORTENING IN X-RAY-LITHOGRAPHY, Microelectronic engineering, 42, 1998, pp. 271-274
Authors:
SHAMOUN B
SPRAGUE M
BEDFORD F
ENGELSTAD R
CERRINA F
Citation: B. Shamoun et al., X-RAY MASK DISTORTIONS DURING E-BEAM PATTERNING, Microelectronic engineering, 42, 1998, pp. 283-286
Authors:
DESTASIO G
GILBERT B
PERFETTI L
FAUCHOUX O
VALIQUER A
NELSON T
CAPOZI M
BAUDAT PA
CERRINA F
CHEN Z
PERFETTI P
TONNER BP
MARGARITONDO G
Citation: G. Destasio et al., SOFT-X-RAY TRANSMISSION PHOTOELECTRON SPECTROMICROSCOPY WITH THE MEPHISTO SYSTEM, Review of scientific instruments, 69(9), 1998, pp. 3106-3108
Authors:
BOLLEPALLI BS
KHAN M
CERRINA F
Citation: Bs. Bollepalli et al., AUTOMATIC MASK GENERATION IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2238-2242
Authors:
FISHER AH
LAUDON MF
ENGELSTAD RL
LOVELL EG
CERRINA F
Citation: Ah. Fisher et al., PATTERN PLACEMENT ERRORS IN MASK MEMBRANES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2249-2254
Authors:
KHAN M
BOLLEPALLI S
CERRINA F
Citation: M. Khan et al., REVISITING PHASE-SHIFTING MASKS IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2255-2258
Authors:
HECTOR S
POL V
KRASNOPEROVA A
MALDONADO J
FLAMHOLZ A
HEALD D
STAHLHAMMER C
GALBURT D
AMODEO R
DONOHUE T
WIND S
BUCHIGNIANO J
VISWANATHAN R
KHAN M
BOLLEPALLI S
CERRINA F
Citation: S. Hector et al., X-RAY-LITHOGRAPHY FOR LESS-THAN-OR-EQUAL-TO-100 NM GROUND RULES IN COMPLEX PATTERNS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2517-2521
Authors:
CHEN Z
VLADIMIRSKY Y
BROWN M
LEONARD Q
VLADIMIRSKY O
MOORE F
CERRINA F
LAI B
YUN W
GLUSKIN E
Citation: Z. Chen et al., DESIGN AND FABRICATION OF FRESNEL ZONE PLATES WITH LARGE NUMBERS OF ZONES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2522-2527
Authors:
OCOLA LE
CERRINA F
MAY T
Citation: Le. Ocola et al., LATENT IMAGE CHARACTERIZATION OF POSTEXPOSURE BAKE PROCESS IN CHEMICALLY AMPLIFIED RESISTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2545-2549
Authors:
LAUDON M
FISHER A
ENGELSTAD R
CERRINA F
CUMMINGS K
DAUKSHER W
RESNICK D
JOHNSON W
PUISTO D
Citation: M. Laudon et al., PREDICTION OF INPLANE DISTORTIONS DUE TO MASK FABRICATION PROCESSES, Microelectronic engineering, 35(1-4), 1997, pp. 549-552
Authors:
DICKS G
BEDFORD F
ENGELSTAD R
CERRINA F
Citation: G. Dicks et al., X-RAY MASK TEMPERATURE DISTRIBUTION AND MAGNIFICATION CONTROL, Microelectronic engineering, 35(1-4), 1997, pp. 561-563
Authors:
CERRINA F
Citation: F. Cerrina, APPLICATION OF X-RAYS TO NANOLITHOGRAPHY, Proceedings of the IEEE, 85(4), 1997, pp. 644-651
Authors:
OCOLA LE
CERRINA F
MAY T
Citation: Le. Ocola et al., SYNCHROTRON-RADIATION MICRO-FOURIER TRANSFORM-INFRARED SPECTROSCOPY APPLIED TO PHOTORESIST IMAGING, Applied physics letters, 71(6), 1997, pp. 847-849
Authors:
SINGH S
SOLAK H
KRASNOPEROV N
CERRINA F
COSSY A
DIAZ J
STOHR J
SAMANT M
Citation: S. Singh et al., AN X-RAY SPECTROMICROSCOPIC STUDY OF THE LOCAL-STRUCTURE OF PATTERNEDTITANIUM SILICIDE, Applied physics letters, 71(1), 1997, pp. 55-57
Authors:
OCOLA LE
FRYER D
NEALEY P
DEPABLO J
CERRINA F
KAMMER S
Citation: Le. Ocola et al., LATENT IMAGE-FORMATION - NANOSCALE TOPOGRAPHY AND CALORIMETRIC MEASUREMENTS IN CHEMICALLY AMPLIFIED RESISTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3974-3979
Authors:
HECTOR S
CHU W
THOMPSON M
POL V
DAUKSHER B
CUMMINGS K
RESNICK D
PENDHARKAR S
MALDONADO J
MCCORD M
KRASNOPEROVA A
LIEBMANN L
SILVERMAN J
GUO J
KHAN M
BOLLEPALLI S
CAPODIECI L
CERRINA F
Citation: S. Hector et al., EXTENDIBILITY OF X-RAY-LITHOGRAPHY TO LESS-THAN-OR-EQUAL-TO-130 NM GROUND RULES IN COMPLEX INTEGRATED-CIRCUIT PATTERNS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4288-4293
Authors:
CERRINA F
MARRIAN C
Citation: F. Cerrina et C. Marrian, A PATH TO NANOLITHOGRAPHY, MRS bulletin, 21(12), 1996, pp. 56-62
Authors:
FANFONI M
GOLETTI C
CHIARADIA P
NG W
CERRINA F
HWU Y
TERRASI A
MARGARITONDO G
Citation: M. Fanfoni et al., SCHOTTKY-BARRIER AT THE AU GAP(110) INTERFACE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2433-2436
Authors:
DELRIO MS
CERRINA F
Citation: Ms. Delrio et F. Cerrina, COMMENTS ON THE USE OF ASYMMETRIC MONOCHROMATORS FOR X-RAY-DIFFRACTION ON A SYNCHROTRON SOURCE - COMMENT, Review of scientific instruments, 67(10), 1996, pp. 3766-3768
Authors:
OCOLA LE
FRYER DS
REYNOLDS G
KRASNOPEROVA A
CERRINA F
Citation: Le. Ocola et al., SCANNING FORCE MICROSCOPY MEASUREMENTS OF LATENT IMAGE TOPOGRAPHY IN CHEMICALLY AMPLIFIED RESISTS, Applied physics letters, 68(5), 1996, pp. 717-719
Authors:
CAPODIECI L
KRASNOPEROVA A
CERRINA F
LYONS C
SPENCE C
EARLY K
Citation: L. Capodieci et al., NOVEL POSTEXPOSURE BAKE SIMULATOR - FIRST RESULTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2963-2967
Authors:
RESNICK DJ
CUMMINGS KD
DAUKSHER WJ
JOHNSON WA
SEESE PA
CHEN HTH
WELLS GM
ENGELSTAD R
CERRINA F
Citation: Dj. Resnick et al., THE EFFECT OF APERTURING ON RADIATION DAMAGE-INDUCED PATTERN DISTORTION OF X-RAY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3046-3049
Authors:
KRASNOPEROVA AA
CHEN Z
DIFABRIZIO E
GENTILI M
CERRINA F
Citation: Aa. Krasnoperova et al., A NOVEL TECHNIQUE FOR HIGH-ASPECT-RATIO HIGH-RESOLUTION PATTERNING OFMEMBRANES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3061-3065
Authors:
WELLS GM
CHEN HTH
WALLACE JP
ENGELSTAD RL
CERRINA F
Citation: Gm. Wells et al., RADIATION DAMAGE-INDUCED CHANGES IN SILICON-NITRIDE MEMBRANE MECHANICAL-PROPERTIES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3075-3077
Authors:
RAYCHAUDHURI AK
NG W
CERRINA F
TAN Z
BJORKHOLM J
TENNANT D
SPECTOR SJ
Citation: Ak. Raychaudhuri et al., ALIGNMENT OF A MULTILAYER-COATED IMAGING-SYSTEM USING EXTREME-ULTRAVIOLET FOUCAULT AND RONCHI INTERFEROMETRIC TESTING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3089-3093