Authors: COHEN LF DESILVA PSIPN MALDE N HOSSAIN AKMA THOMAS KA CHATER R MACMANUSDRISCOLL JD TATE T MATHUR ND BLAMIRE MG EVETTS JE

Citation: Lf. Cohen et al., REENTRANT METAL-INSULATOR-TYPE TRANSITION INDUCED BY HIGH FLUENCE CHROMIUM ION-IMPLANTATION OF LA0.7CA0.3MNO3 THIN-FILMS, Applied physics letters, 73(7), 1998, pp. 1005-1007