Authors:
COHEN LF
DESILVA PSIPN
MALDE N
HOSSAIN AKMA
THOMAS KA
CHATER R
MACMANUSDRISCOLL JD
TATE T
MATHUR ND
BLAMIRE MG
EVETTS JE
Citation: Lf. Cohen et al., REENTRANT METAL-INSULATOR-TYPE TRANSITION INDUCED BY HIGH FLUENCE CHROMIUM ION-IMPLANTATION OF LA0.7CA0.3MNO3 THIN-FILMS, Applied physics letters, 73(7), 1998, pp. 1005-1007