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PREPARATION AND METAL-TO-INSULATOR TRANSITION (MIT) CHARACTERISTICS OF MULTIPHASE VANADIUM-OXIDE THIN-FILMS
Authors:
KO KH AHN JH CHI UU
Citation:
Kh. Ko et al., PREPARATION AND METAL-TO-INSULATOR TRANSITION (MIT) CHARACTERISTICS OF MULTIPHASE VANADIUM-OXIDE THIN-FILMS, Nippon Seramikkusu Kyokai gakujutsu ronbunshi, 103(3), 1995, pp. 217-221
Risultati:
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