Authors:
BOUVET D
CLIVAZ PA
DUTOIT M
COLUZZA C
ALMEIDA J
MARGARITONDO G
PIO F
Citation: D. Bouvet et al., INFLUENCE OF NITROGEN PROFILE AN ELECTRICAL CHARACTERISTICS OF FURNACE-NITRIDED OR RAPID THERMALLY NITRIDED SILICON DIOXIDE FILMS, Journal of applied physics, 79(9), 1996, pp. 7114-7122