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Authors: BOUVET D CLIVAZ PA DUTOIT M COLUZZA C ALMEIDA J MARGARITONDO G PIO F
Citation: D. Bouvet et al., INFLUENCE OF NITROGEN PROFILE AN ELECTRICAL CHARACTERISTICS OF FURNACE-NITRIDED OR RAPID THERMALLY NITRIDED SILICON DIOXIDE FILMS, Journal of applied physics, 79(9), 1996, pp. 7114-7122
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