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Authors: CLOUGH FJ NARAYANAN EMS CHEN Y ECCLESTON W MILNE WI

Citation: Fj. Clough et al., POLYCRYSTALLINE SILICON THIN-FILM-TRANSISTOR INCORPORATING A SEMIINSULATING FIELD PLATE FOR HIGH-VOLTAGE CIRCUITRY ON GLASS, Applied physics letters, 71(14), 1997, pp. 2002-2004

Authors: CLOUGH FJ MILNE WI KLEINSORGE B ROBERTSON J AMARATUNGA GAJ ROY BN

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Authors: CLOUGH FJ BROWN AO MADATHIL SNE MILNE WI

Citation: Fj. Clough et al., LOW-TEMPERATURE (LESS-THAN-OR-EQUAL-TO-600-DEGREES-C) SEMIINSULATING OXYGEN-DOPED SILICON FILMS BY THE PECVD TECHNIQUE FOR LARGE-AREA POWERAPPLICATIONS, Microelectronic engineering, 28(1-4), 1995, pp. 451-454

Authors: CLOUGH FJ BROWN AO MADATHIL SNE MILNE WI

Citation: Fj. Clough et al., LOW-TEMPERATURE (LESS-THAN-OR-EQUAL-TO-600-DEGREES-C) SEMIINSULATING OXYGEN-DOPED SILICON FILMS BY THE PECVD TECHNIQUE FOR LARGE-AREA POWERAPPLICATIONS, Thin solid films, 270(1-2), 1995, pp. 517-521