Authors: COLLISON WZ NI TQ BARNES MS

Citation: Wz. Collison et al., STUDIES OF THE LOW-PRESSURE INDUCTIVELY-COUPLED PLASMA-ETCHING FOR A LARGER AREA WAFER USING PLASMA MODELING AND LANGMUIR PROBE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(1), 1998, pp. 100-107

Authors: KUSHNER MJ COLLISON WZ RUZIC DN

Citation: Mj. Kushner et al., ELECTRON-BEAM CONTROLLED RADIO-FREQUENCY DISCHARGES FOR PLASMA PROCESSING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2094-2101

Authors: COLLISON WZ KUSHNER MJ

Citation: Wz. Collison et Mj. Kushner, CONCEPTUAL DESIGN OF ADVANCED INDUCTIVELY-COUPLED PLASMA-ETCHING TOOLS USING COMPUTER MODELING, IEEE transactions on plasma science, 24(1), 1996, pp. 135-136

Authors: KUSHNER MJ COLLISON WZ GRAPPERHAUS MJ HOLLAND JP BARNES MS

Citation: Mj. Kushner et al., A 3-DIMENSIONAL MODEL FOR INDUCTIVELY-COUPLED PLASMA-ETCHING REACTORS- AZIMUTHAL SYMMETRY, COIL PROPERTIES, AND COMPARISON TO EXPERIMENTS, Journal of applied physics, 80(3), 1996, pp. 1337-1344

Authors: COLLISON WZ KUSHNER MJ

Citation: Wz. Collison et Mj. Kushner, ION DRAG EFFECTS IN INDUCTIVELY-COUPLED PLASMAS FOR ETCHING, Applied physics letters, 68(7), 1996, pp. 903-905