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Citation: Jm. Shaw et al., NEGATIVE PHOTORESISTS FOR OPTICAL LITHOGRAPHY, IBM journal of research and development, 41(1-2), 1997, pp. 81-94

Authors: ALLEN RD WALLRAFF GM HINSBERG WD CONLEY WE KUNZ RR

Citation: Rd. Allen et al., NEW SINGLE-LAYER POSITIVE RESISTS FOR 193-NM AND 248-NM LITHOGRAPHY USING METHACRYLATE POLYMERS, Solid state technology, 36(11), 1993, pp. 53