Citation: Lb. Chang et al., Etching selectivity and surface profile of GaN in the Ni, SiO2 and photoresist masks using an inductively coupled plasma, JPN J A P 1, 40(3A), 2001, pp. 1242-1243
Citation: Mj. Jeng et al., Surface passivation using P2S5/(NH4)(2)S-x and hydrogen fluoride solutionson Ag/n-InAs and Ag/n-InSb Schottky diodes, JPN J A P 1, 40(2A), 2001, pp. 562-564
Citation: Mj. Jeng et al., Barrier height enhancement of Ni/N-type InP Schottky contact using a thin praseodymium interlayer, JPN J A P 2, 38(12A), 1999, pp. L1382-L1384
Citation: Ht. Wang et al., Characterization of Pr2O3 added metals/GaAs Schottky diodes using X-ray Photoelectron Spectroscopy, CRYST RES T, 34(8), 1999, pp. 1017-1021
Authors:
Jiaang, WT
Lin, HC
Tang, KH
Chang, LB
Tsai, YM
Citation: Wt. Jiaang et al., The study of the kinetics of intramolecular radical cyclizations of acylsilanes via the intramolecular competition method, J ORG CHEM, 64(2), 1999, pp. 618-628
Citation: Mj. Jeng et al., Barrier height enhancement of Ag/n-GaAs and Ag/n-InP Schottky diodes prepared by P2S5/(NH4)(2)S-x and HF treatments, J APPL PHYS, 86(11), 1999, pp. 6261-6263
Citation: Jp. Lin et al., Improvement of Al/GaAs Schottky junction characteristics using a thin praseodymium interlayer, JPN J A P 2, 37(12A), 1998, pp. L1437-L1439