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Results: 1
A comprehensive study of hot carrier stress-induced drain leakage current degradation in thin-oxide n-MOSFET's
Authors:
Wang, TH Chiang, LP Zous, NK Hsu, CF Huang, LY Chao, TS
Citation:
Th. Wang et al., A comprehensive study of hot carrier stress-induced drain leakage current degradation in thin-oxide n-MOSFET's, IEEE DEVICE, 46(9), 1999, pp. 1877-1882
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