Authors: de Souza, JP Suprun-Belevich, Y Boudinov, H Cima, CA

Citation: Jp. De Souza et al., Mechanical strain and damage in Si implanted with O and N ions at elevatedtemperatures: Evidence of ion beam induced annealing, J APPL PHYS, 89(1), 2001, pp. 42-46

Authors: Cima, CA Boudinov, H de Souza, JP Suprun-Belevich, Y Fichtner, PFP

Citation: Ca. Cima et al., Strain development and damage accumulation during neon ion implantation into silicon at elevated temperatures, J APPL PHYS, 88(4), 2000, pp. 1771-1775

Authors: de Souza, JP Suprun-Belevich, Y Boudinov, H Cima, CA

Citation: Jp. De Souza et al., Damage accumulation in Si crystal during ion implantation at elevated temperatures: Evidence of chemical effects, J APPL PHYS, 87(12), 2000, pp. 8385-8388