Authors: Cismaru, C Shohet, JL

Citation: C. Cismaru et Jl. Shohet, In situ electrical characterization of dielectric thin films directly exposed to plasma vacuum-ultraviolet radiation, J APPL PHYS, 88(4), 2000, pp. 1742-1746

Authors: Cismaru, C Shohet, JL Lauer, JL Hansen, RW Ostapenko, S

Citation: C. Cismaru et al., Depletion of charge produced during plasma exposure in aluminum oxide by vacuum ultraviolet radiation, APPL PHYS L, 77(24), 2000, pp. 3914-3916

Authors: Cismaru, C Shohet, JL McVittie, JP

Citation: C. Cismaru et al., Synchrotron radiation-induced surface-conductivity of SiO2 for modification of plasma charging, APPL PHYS L, 76(16), 2000, pp. 2191-2193

Authors: Cismaru, C Shohet, JL

Citation: C. Cismaru et Jl. Shohet, Plasma vacuum ultraviolet emission in an electron cyclotron resonance etcher, APPL PHYS L, 74(18), 1999, pp. 2599-2601